Investigation of MoS2 Based Dual Gate MOSFET as a H2 Sensor Considering Catalytic Metal Gate Approach

Arpan De, Ananya Karmakar, R. Ghosh, Priyanka Saha
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引用次数: 1

Abstract

In this paper, the authors have tried to develop a simulation model for MoS2 or molybdenum disulfide based dual gate MOSFET (MoS2 DG-MOSFET) by considering catalytic metal gate approach to detect hydrogen (H2) gas molecules. Here, the simulation model of the proposed gas sensor has been assessed by incorporating the NEGF method in SILVACO ATLAS. In addition to this, the performance of the device has been evaluated by studying the shift in its threshold voltage against the variation in metal (gate) work-function with the gas exposure. The results obtained exhibit maximum shift in the threshold voltage (precisely 232 mV) for a metal work function change of 200 meV. Moreover, the paper also demonstrates the change in density of states, transmission probability etc. in the presence of H2 gas molecules. The proposed device overcomes the challenges associated with conventional Si-based MOSFETs for gas sensing, takes care of scalability of a sensor and provides improved OFF-state leakage current along with large ION and IOFF ratio.
基于催化金属栅极方法的MoS2基双栅极MOSFET氢气传感器研究
本文中,作者试图建立一个基于二硫化钼或二硫化钼的双栅极MOSFET (MoS2 DG-MOSFET)的模拟模型,考虑催化金属栅极方法来检测氢气(H2)气体分子。本文通过在SILVACO ATLAS中结合NEGF方法对所提出的气体传感器的仿真模型进行了评估。除此之外,还通过研究其阈值电压随金属(栅极)工作功能随气体暴露变化的变化来评估该器件的性能。结果表明,当金属功函数变化为200 meV时,阈值电压的最大位移(精确地为232 mV)。此外,本文还论证了H2气体分子存在下的态密度、传输概率等的变化。该器件克服了传统硅基mosfet用于气体传感的挑战,兼顾了传感器的可扩展性,并提供了改进的off状态泄漏电流以及大的离子和IOFF比。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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