D. Leung, Y. Chou, C. Wu, R. Kono, J. Scarpulla, R. Lai, M. Hoppe, D. Streit
{"title":"High reliability non-hermetic 0.15 /spl mu/m GaAs pseudomorphic HEMT MMIC amplifiers","authors":"D. Leung, Y. Chou, C. Wu, R. Kono, J. Scarpulla, R. Lai, M. Hoppe, D. Streit","doi":"10.1109/RFIC.1999.805259","DOIUrl":null,"url":null,"abstract":"High reliability performance of a Ka-band low-noise MMIC amplifier fabricated using a 0.15 /spl mu/m production AlGaAs-InGaAs-GaAs HEMT process technology is reported. Operating at an accelerated DC bias condition of Vds=5.2 V and Ids=250 mA/mm, two-stage balanced amplifiers were lifetested at three-temperatures (T/sub ambient/=235/spl deg/C, T/sub ambient/=250/spl deg/C, and T/sub ambient/=265/spl deg/C) in air ambient. Failure time for each temperature was determined using /spl Delta/S21=-1.0 dB measured at room temperature as the failure criteria. The activation energy (Ea) is 1.6 eV, achieving a projected median-time-to-failure (MTF) of 7/spl times/10/sup 9/ hours at a 125/spl deg/C junction temperature. This is the first report of 0.15 /spl mu/m HEMT reliability based on S21 failure criteria of MMIC amplifiers under DC stress at high junction temperature in air ambient. This result demonstrates a robust HEMT technology immune to the stress effects of high electric field under high temperature operation suitable for non-hermetic commercial Ka-band applications.","PeriodicalId":447109,"journal":{"name":"1999 IEEE Radio Frequency Integrated Circuits Symposium (Cat No.99CH37001)","volume":"10 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1999-06-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"24","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"1999 IEEE Radio Frequency Integrated Circuits Symposium (Cat No.99CH37001)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/RFIC.1999.805259","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 24
Abstract
High reliability performance of a Ka-band low-noise MMIC amplifier fabricated using a 0.15 /spl mu/m production AlGaAs-InGaAs-GaAs HEMT process technology is reported. Operating at an accelerated DC bias condition of Vds=5.2 V and Ids=250 mA/mm, two-stage balanced amplifiers were lifetested at three-temperatures (T/sub ambient/=235/spl deg/C, T/sub ambient/=250/spl deg/C, and T/sub ambient/=265/spl deg/C) in air ambient. Failure time for each temperature was determined using /spl Delta/S21=-1.0 dB measured at room temperature as the failure criteria. The activation energy (Ea) is 1.6 eV, achieving a projected median-time-to-failure (MTF) of 7/spl times/10/sup 9/ hours at a 125/spl deg/C junction temperature. This is the first report of 0.15 /spl mu/m HEMT reliability based on S21 failure criteria of MMIC amplifiers under DC stress at high junction temperature in air ambient. This result demonstrates a robust HEMT technology immune to the stress effects of high electric field under high temperature operation suitable for non-hermetic commercial Ka-band applications.