0.1 /spl mu/m InP HEMT devices and MMICs for cryogenic low noise amplifiers from X-band to W-band

R. Grundbacher, R. Lai, M. Barsky, R. Tsai, T. Gaier, S. Weinreb, D. Dawson, J. Bautista, J.F. Davis, N. Erickson, T. Block, A. Oki
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引用次数: 39

Abstract

We present the TRW 0.1 /spl mu/m InP HEMT MMIC production technology that has been developed and used for state-of-the-art cryogenic LNA applications. The 0.1 /spl mu/m InP HEMT devices typically show cutoff frequency above 200 GHz and transconductance above 1000 mS/mm. Aspects of device design and fabrication are presented which impact important parameters including the InP HEMT device gain, gate leakage current, and parasitic capacitance. One example of state-of-the-art cryogenic MMIC performance is a W-band cryogenic MMIC LNA operated at 20 degrees Kelvin that shows above 23 dB gain and a noise temperature of 30 to 40 K (0.45 to 0.6 dB noise figure) over the band of 80-105 GHz.
0.1 /spl mu/m用于x波段至w波段低温低噪声放大器的InP HEMT器件和mmic
我们介绍了TRW 0.1 /spl mu/m InP HEMT MMIC生产技术,该技术已开发并用于最先进的低温LNA应用。0.1 /spl mu/m InP HEMT器件的截止频率通常在200 GHz以上,跨导率高于1000 mS/mm。介绍了影响器件增益、栅极漏电流和寄生电容等重要参数的器件设计和制造方面的问题。最先进的低温MMIC性能的一个例子是在20开尔文下工作的w波段低温MMIC LNA,在80-105 GHz频段上显示超过23 dB的增益和30至40 K(0.45至0.6 dB噪声系数)的噪声温度。
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