M. Urteaga, A. Carter, Z. Griffith, R. Pierson, J. Bergman, A. Arias, P. Rowell, J. Hacker, B. Brar, M. Rodwell
{"title":"THz bandwidth InP HBT technologies and heterogeneous integration with Si CMOS","authors":"M. Urteaga, A. Carter, Z. Griffith, R. Pierson, J. Bergman, A. Arias, P. Rowell, J. Hacker, B. Brar, M. Rodwell","doi":"10.1109/BCTM.2016.7738973","DOIUrl":null,"url":null,"abstract":"Through aggressive lithographical and epitaxial scaling, the bandwidths of InP-based heterojunction bipolar transistors have been extended to THz frequencies. At 130nm emitter dimensions, transistors with maximum frequencies of oscillation (fmax) of >1THz have been demonstrated with accompanying circuit demonstrations at 670GHz. At 250nm emitter dimensions, high efficiency and high power density mm-wave power amplifiers covering E-band (71GHz) to G-band (235GHz) have been fabricated. The utility of these high performance transistors can be further enhanced through heterogeneous integration with Si CMOS. We have demonstrated wafer-scale 3D integration of InP and Si using a low temperature oxide-to-oxide bonding process with embedded Cu interconnects.","PeriodicalId":431327,"journal":{"name":"2016 IEEE Bipolar/BiCMOS Circuits and Technology Meeting (BCTM)","volume":"1 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2016-09-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"17","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2016 IEEE Bipolar/BiCMOS Circuits and Technology Meeting (BCTM)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/BCTM.2016.7738973","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 17
Abstract
Through aggressive lithographical and epitaxial scaling, the bandwidths of InP-based heterojunction bipolar transistors have been extended to THz frequencies. At 130nm emitter dimensions, transistors with maximum frequencies of oscillation (fmax) of >1THz have been demonstrated with accompanying circuit demonstrations at 670GHz. At 250nm emitter dimensions, high efficiency and high power density mm-wave power amplifiers covering E-band (71GHz) to G-band (235GHz) have been fabricated. The utility of these high performance transistors can be further enhanced through heterogeneous integration with Si CMOS. We have demonstrated wafer-scale 3D integration of InP and Si using a low temperature oxide-to-oxide bonding process with embedded Cu interconnects.