THz bandwidth InP HBT technologies and heterogeneous integration with Si CMOS

M. Urteaga, A. Carter, Z. Griffith, R. Pierson, J. Bergman, A. Arias, P. Rowell, J. Hacker, B. Brar, M. Rodwell
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引用次数: 17

Abstract

Through aggressive lithographical and epitaxial scaling, the bandwidths of InP-based heterojunction bipolar transistors have been extended to THz frequencies. At 130nm emitter dimensions, transistors with maximum frequencies of oscillation (fmax) of >1THz have been demonstrated with accompanying circuit demonstrations at 670GHz. At 250nm emitter dimensions, high efficiency and high power density mm-wave power amplifiers covering E-band (71GHz) to G-band (235GHz) have been fabricated. The utility of these high performance transistors can be further enhanced through heterogeneous integration with Si CMOS. We have demonstrated wafer-scale 3D integration of InP and Si using a low temperature oxide-to-oxide bonding process with embedded Cu interconnects.
太赫兹带宽在p HBT技术和异质集成与硅CMOS
通过积极的光刻和外延缩放,基于inp的异质结双极晶体管的带宽已经扩展到太赫兹频率。在130nm发射极尺寸下,已经演示了最大振荡频率(fmax) >1THz的晶体管,并在670GHz下进行了相应的电路演示。在250nm发射极尺寸下,制备了覆盖e频段(71GHz)至g频段(235GHz)的高效率、高功率密度毫米波功率放大器。通过与Si CMOS的异质集成,可以进一步增强这些高性能晶体管的实用性。我们已经演示了使用嵌入Cu互连的低温氧化物键合工艺实现InP和Si的晶圆级3D集成。
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