S. Amoroso, C. Alexander, S. Markov, G. Roy, A. Asenov
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引用次数: 3
Abstract
A comprehensive statistical investigation of the increase in resistance associated with charge trapping in ‘atomistic’ simulations is presented considering a wide range of doping densities and mesh spacing for both classical and quantum formalisms. A modified mobility model for the ‘atomistic’ simulations is proposed to suppress the error related to the fictitious charge trapping.