State-of-the-Art High-Resolution 3D X-ray Microscopy for Imaging of Integrated Circuits

M. Holler, M. Guizar‐Sicairos, J. Raabe
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Abstract

X-ray ptychography, as recent studies show, has the potential to bridge the gap that currently exists between conventional X-ray imaging and electron microscopy. This article covers the evolution of the technology from basic 2D imaging to computed tomography to 3D ptychographic X-ray laminography (PyXL) with zoom. To demonstrate the capabilities of PyXL, a 16-nm FinFET logic IC was mechanically polished to a thickness of 20 µm and several regions were imaged at various levels of resolution.
用于集成电路成像的最先进的高分辨率3D x射线显微镜
最近的研究表明,x射线型照相术有可能弥补传统x射线成像和电子显微镜之间存在的差距。本文介绍了从基本的二维成像到计算机断层扫描再到带变焦的三维平面x射线层析成像(PyXL)技术的演变。为了证明PyXL的能力,将16纳米FinFET逻辑IC机械抛光至20 μ m厚度,并以不同分辨率对多个区域进行成像。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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