Rohit R. Karnaty, U. Mishra, J. Buckwalter, M. Guidry, P. Shrestha, B. Romanczyk, N. Hatui, Xun Zheng, C. Wurm, Haoran Li, S. Keller
{"title":"Virtual-Source Modeling of N-polar GaN MISHEMTS","authors":"Rohit R. Karnaty, U. Mishra, J. Buckwalter, M. Guidry, P. Shrestha, B. Romanczyk, N. Hatui, Xun Zheng, C. Wurm, Haoran Li, S. Keller","doi":"10.1109/BCICTS45179.2019.8972774","DOIUrl":null,"url":null,"abstract":"Nitrogen-polar (N-polar) Gallium Nitride (GaN) deep-recess high-electron mobility transistors (HEMTs) have demonstrated exceptional power density (8 W/mm) and high efficiency at 30 and 94 GHz. Unlike the conventional Galliumpolar GaN which have typical Silicon Nitride passivation, the Npolar deep-recess structure has a GaN cap layer added in the access region of the transistor to enhance the conductivity while reducing the DC-to-RF dispersion. Previously, the MIT virtual source (VS) model has been proposed as a physics-based approach to modeling Ga-polar devices. This work investigates the application of the VS model to N-polar GaN HEMTs. We present a comparison of DC-IV between the developed model and a fabricated device to demonstrate good agreement.","PeriodicalId":243314,"journal":{"name":"2019 IEEE BiCMOS and Compound semiconductor Integrated Circuits and Technology Symposium (BCICTS)","volume":"154 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2019-11-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"2","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2019 IEEE BiCMOS and Compound semiconductor Integrated Circuits and Technology Symposium (BCICTS)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/BCICTS45179.2019.8972774","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 2
Abstract
Nitrogen-polar (N-polar) Gallium Nitride (GaN) deep-recess high-electron mobility transistors (HEMTs) have demonstrated exceptional power density (8 W/mm) and high efficiency at 30 and 94 GHz. Unlike the conventional Galliumpolar GaN which have typical Silicon Nitride passivation, the Npolar deep-recess structure has a GaN cap layer added in the access region of the transistor to enhance the conductivity while reducing the DC-to-RF dispersion. Previously, the MIT virtual source (VS) model has been proposed as a physics-based approach to modeling Ga-polar devices. This work investigates the application of the VS model to N-polar GaN HEMTs. We present a comparison of DC-IV between the developed model and a fabricated device to demonstrate good agreement.