Advanced metrology and inspection solutions for a 3D world

I. Schulmeyer, L. Lechner, A. Gu, R. Estrada, D. Stewart, L. Stern, S. McVey, B. Goetze, U. Mantz, R. Jammy
{"title":"Advanced metrology and inspection solutions for a 3D world","authors":"I. Schulmeyer, L. Lechner, A. Gu, R. Estrada, D. Stewart, L. Stern, S. McVey, B. Goetze, U. Mantz, R. Jammy","doi":"10.1109/VLSI-TSA.2016.7480508","DOIUrl":null,"url":null,"abstract":"Semiconductor devices and packages have firmly moved in to an era where scaling is driven by 3D architectures. However, most of the metrology and inspection technologies in use today were developed for 2D devices and are inadequate to deal with 3D structures. An additional complication is the need for specific structural and defect information that may be buried deep within a 3D structure. We present concepts and technologies that allow for 3D imaging as well as tomography, enabling engineers to view structural information with unprecedented clarity, detail and speed.","PeriodicalId":441941,"journal":{"name":"2016 International Symposium on VLSI Technology, Systems and Application (VLSI-TSA)","volume":"170 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2016-04-25","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"2","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2016 International Symposium on VLSI Technology, Systems and Application (VLSI-TSA)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/VLSI-TSA.2016.7480508","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 2

Abstract

Semiconductor devices and packages have firmly moved in to an era where scaling is driven by 3D architectures. However, most of the metrology and inspection technologies in use today were developed for 2D devices and are inadequate to deal with 3D structures. An additional complication is the need for specific structural and defect information that may be buried deep within a 3D structure. We present concepts and technologies that allow for 3D imaging as well as tomography, enabling engineers to view structural information with unprecedented clarity, detail and speed.
面向3D世界的先进计量和检测解决方案
半导体器件和封装已经坚定地进入了一个由3D架构驱动的扩展时代。然而,目前使用的大多数计量和检测技术都是为2D设备开发的,不足以处理3D结构。另一个复杂的问题是需要特定的结构和缺陷信息,这些信息可能深埋在3D结构中。我们提出的概念和技术允许3D成像和断层扫描,使工程师能够以前所未有的清晰度、细节和速度查看结构信息。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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