Very low bandgap voltage reference with high PSRR enhancement stage implemented in 90nm CMOS process technology for LDO application

K. R. Francisco, J. Hora
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引用次数: 12

Abstract

A low voltage bandgap reference with a high power supply rejection ratio is implemented in TSMC 90nm 1P9M 3.3V CMOS Process Technology. This design can be applied to LDO voltage regulators particularly used in wireless devices and ADC's whose immunity to noise is an essential property. Its power supply rejection ratio is improved by an enhancement stage so as to achieve a high performance analog and digital system which is usually limited by the PSRR of the bandgap reference. The design operates within a range of 2.6 to 3.6 V and has very small temperature and supply sensitivities measuring 6 ppm/°C and 20μV/V, respectively. The circuit's current consumption is around 127.117 μA and produces an output voltage of 213.982 mV. The design's PSRR is 82.7 dB and it has a total chip core area of 0.0137 mm2.
超低带隙基准电压,高PSRR增强级,采用90nm CMOS工艺技术实现LDO应用
采用台积电90nm 1P9M 3.3V CMOS工艺技术,实现了具有高电源抑制比的低电压带隙基准电路。该设计可应用于LDO稳压器,特别是用于无线设备和ADC的稳压器,其抗噪声性是必不可少的特性。它的电源抑制比通过一个增强级来提高,从而实现高性能的模拟和数字系统,而这通常受到带隙基准的PSRR的限制。该设计工作在2.6至3.6 V范围内,具有非常小的温度和电源灵敏度,分别为6 ppm/°C和20μV/V。电路的电流消耗约为127.117 μA,输出电压为213.982 mV。该设计的PSRR为82.7 dB,芯片总核心面积为0.0137 mm2。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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