Advanced HiGT with low-injection punch-through (LiPT) structure [high-conductivity IGBT]

K. Oyama, T. Arai, K. Saitou, K. Masuda, M. Mori
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引用次数: 17

Abstract

This paper describes a new advanced HiGT (high-conductivity IGBT) which is the combination of a low injection (LiPT: low injection punch-through) p-emitter and a planar gate with a hole barrier and punchthrough structure. The experimental results and theoretical discussion of this 4.5 kV advanced HiGT show remarkable low-loss characteristics and strong short-circuit immunity. These results prove for the first time that a hole barrier integrated in a planar IGBT is effective even with LiPT.
具有低注入打孔(LiPT)结构的先进ight[高导电性IGBT]
本文介绍了一种新型的高导电性IGBT (high-conductivity IGBT),它是由低注入(LiPT: low injection) p-emitter和具有孔垒和穿孔结构的平面栅极相结合而成的。实验结果和理论讨论表明,该4.5 kV高级HiGT具有显著的低损耗特性和较强的抗短路性。这些结果首次证明,即使使用LiPT,集成在平面IGBT中的孔势垒也是有效的。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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