Advantages of SiGe-pnp over Si-pnp for analog and RF enhanced CBiCMOS and Complementary Bipolar design usage

J. Babcock, Joel Halbert, H. Yasuda, A. Sadovnikov, Jonggook Kim, A. Buchholz, Robert Malone, M. Corsi, G. Cestra, M. Dahlstrom
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Abstract

The evolution of silicon and silicon-germanium pnp transistors is reviewed in this paper. The motivation for SiGe-pnp transistors in Complementary Bipolar (CBi) and CBiCMOS is discussed with a view on device parametric parameters that help gage the usefulness of these devices in analog and RF design. We review the basic process architectures and process building blocks for CBiCMOS. SiGe-pnp versus Si-pnp performance metrics are highlighted followed by a discussion on circuit blocks that benefit from having near matched complementary bipolar transistors.
SiGe-pnp相对于Si-pnp在模拟和射频增强CBiCMOS和互补双极设计中的优势
本文综述了硅和硅锗pnp晶体管的发展历程。讨论了互补双极(CBi)和CBiCMOS中SiGe-pnp晶体管的动机,并从器件参数参数的角度来帮助衡量这些器件在模拟和射频设计中的有用性。我们回顾了CBiCMOS的基本工艺体系结构和工艺构建块。重点介绍了SiGe-pnp与Si-pnp性能指标,然后讨论了得益于接近匹配的互补双极晶体管的电路模块。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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