{"title":"Novel structures enabling bulk switching in carbon nanotube FETs","authors":"Y. Lin, J. Appenzeller, P. Avouris","doi":"10.1109/DRC.2004.1367820","DOIUrl":null,"url":null,"abstract":"In order to alleviate the disadvantages associated with Schottky barriers in CNFETs, it is necessary to design CNFETs with bulk switching properties meaning that the bulk portion of the nanotube rather than the interface controls the CNFET characteristics. Here we present the first self-aligned bulk-switched CNFET that operates in the enhancement mode with a p-i-p (or n-i-n) doping profile along the tube. With our novel approach, we successfully fabricated CNFETs with excellent switching (S/spl sim/63 mV/dec), the smallest value reported for CNFETs so far, and very good performance in terms of their drain-induced-barrier-lowering (DIBL)-like behavior.","PeriodicalId":385948,"journal":{"name":"Conference Digest [Includes 'Late News Papers' volume] Device Research Conference, 2004. 62nd DRC.","volume":"36 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2004-06-21","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"18","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Conference Digest [Includes 'Late News Papers' volume] Device Research Conference, 2004. 62nd DRC.","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/DRC.2004.1367820","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 18
Abstract
In order to alleviate the disadvantages associated with Schottky barriers in CNFETs, it is necessary to design CNFETs with bulk switching properties meaning that the bulk portion of the nanotube rather than the interface controls the CNFET characteristics. Here we present the first self-aligned bulk-switched CNFET that operates in the enhancement mode with a p-i-p (or n-i-n) doping profile along the tube. With our novel approach, we successfully fabricated CNFETs with excellent switching (S/spl sim/63 mV/dec), the smallest value reported for CNFETs so far, and very good performance in terms of their drain-induced-barrier-lowering (DIBL)-like behavior.