45nm gate length Bulk/PD-SOI CMOS transistors with low gate leakage current for high speed and low power applications

C.K. Yang, T.F. Chen, C. Liang, T.J. Chen, T. Chang, L. W. Cheng, H. Lin, G. Li, D.Y. Wu, J.K. Chen, S. Chien, S. Sun, J. Cheek, M. Michael, D. Wu, P. Fisher, D. Wristers
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引用次数: 1

Abstract

45 nm gate length bulk/PD (partially depleted) SOI transistors, with high performance and ultra-low gate leakage, are presented in this paper. The nFETs and pFETs, operating at Vdd=1.2 V, possess driving currents of 1050 /spl mu/A//spl mu/m and 450 /spl mu/A//spl mu/m, as well as 980 /spl mu/A//spl mu/m and 490 /spl mu/A//spl mu/m at Ioff=20 nA//spl mu/m for bulk and PD-SOI devices respectively. The inversion gate leakage is only 1 A/cm/sup 2/ at Vdd=1.0 V. The robust device performance is quite suitable for both high speed and low operating power applications.
45nm栅极长度,具有低栅极漏电流的Bulk/PD-SOI CMOS晶体管,适用于高速和低功耗应用
本文提出了45 nm栅极长块体/PD(部分耗尽)SOI晶体管,具有高性能和超低栅漏。在Vdd=1.2 V时,非场效应管和pfet器件的驱动电流分别为1050 /spl μ /A//spl μ /m和450 /spl μ /A//spl μ /m,在Ioff=20 nA//spl μ /m时,驱动电流分别为980 /spl μ /A//spl μ /m和490 /spl μ /A//spl μ /m。在Vdd=1.0 V时,逆变栅漏电流仅为1 A/cm/sup 2/。稳健的器件性能非常适合高速和低工作功率的应用。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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