Electron transport in low temperature grown GaAs

P. Arifin, T. Tansley, E. Goldys
{"title":"Electron transport in low temperature grown GaAs","authors":"P. Arifin, T. Tansley, E. Goldys","doi":"10.1109/COMMAD.1996.610142","DOIUrl":null,"url":null,"abstract":"MBE grown low temperature GaAs layers have been annealed at various temperatures up to 600/spl deg/C and their structural and transport properties examined. Excess As precipitation is confirmed by TEM measurements. Both hopping and band transport are present in the material annealed at temperatures up to 500/spl deg/C. The measured mobility for 600/spl deg/C annealed material agrees well with predictions of Monte Carlo calculations taking full account of precipitate scattering.","PeriodicalId":171952,"journal":{"name":"1996 Conference on Optoelectronic and Microelectronic Materials and Devices. Proceedings","volume":"5 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1996-12-08","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"1996 Conference on Optoelectronic and Microelectronic Materials and Devices. Proceedings","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/COMMAD.1996.610142","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
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Abstract

MBE grown low temperature GaAs layers have been annealed at various temperatures up to 600/spl deg/C and their structural and transport properties examined. Excess As precipitation is confirmed by TEM measurements. Both hopping and band transport are present in the material annealed at temperatures up to 500/spl deg/C. The measured mobility for 600/spl deg/C annealed material agrees well with predictions of Monte Carlo calculations taking full account of precipitate scattering.
低温生长GaAs中的电子输运
对MBE生长的低温砷化镓层进行了高达600℃的退火处理,并对其结构和输运性能进行了研究。透射电镜测量证实了过量的As降水。在高达500/spl℃的温度下退火的材料中存在跳变和能带输运。在充分考虑析出物散射的情况下,对600/spl℃退火材料迁移率的测量结果与蒙特卡罗计算的预测结果吻合得很好。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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