STARC's Semiconductor Design Technology Research Activities and the HiSIM2 Advanced MOSFET Model Project

Y. Furui, M. Miura-Mattausch, N. Sadachika, M. Miyake, T. Ezaki, H. Mattausch, T. Ohguro, T. Iizuka, R. Inagaki, N. Fudanuki
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Abstract

STARC (Semiconductor Technology Academic Research Center) is a research consortium co-founded by major Japanese semiconductor companies, whose mission is to contribute to the growth of the Japanese semiconductor industry by developing leading-edge SoC design technologies. One of the achievements enabled by the academia collaboration is HiSIM (Hiroshima University STARC IGFET Model) an advanced MOSFET Model. The HiSIM2 version includes required features in modeling for the 45 nm technology node and beyond such as the STI effect. A major development is an improved model consistency, which enables even modeling of the technology variation accurately. HiSIM2 realizes both accurate and fast circuit simulation.
STARC的半导体设计技术研究活动和HiSIM2先进MOSFET模型项目
STARC(半导体技术学术研究中心)是由日本主要半导体公司共同创立的研究联盟,其使命是通过开发领先的SoC设计技术,为日本半导体产业的发展做出贡献。广岛大学STARC IGFET模型(HiSIM)是一种先进的MOSFET模型。HiSIM2版本包含了45纳米及以上技术节点建模所需的功能,例如STI效应。一个主要的开发是改进的模型一致性,它甚至可以准确地对技术变化进行建模。HiSIM2实现了精确、快速的电路仿真。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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