{"title":"Technology and Optimizations for the NOI-Nano-Triode","authors":"C. Ravariu, C. Parvulescu, V. Placinta","doi":"10.1109/SMICND.2019.8923917","DOIUrl":null,"url":null,"abstract":"This paper adds some contributions for a Nothing On Insulator (NOI) nano-triode. The concept was introduced first time in 2018. The NOI-nano-triode has the advantages as: reduced sizes as a NOI transistor, a seriously improved subthreshold slope from 650/dec of an experimental vacuum transistor to 210mV/dec of the simulated NOI-nano-triode. The paid price is a non-null gate current. Besides to the optimal architecture with minimum SS parameter, the paper presents a technological flow for this device, aided by Athena tool.","PeriodicalId":151985,"journal":{"name":"2019 International Semiconductor Conference (CAS)","volume":"17 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2019-10-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2019 International Semiconductor Conference (CAS)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/SMICND.2019.8923917","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
This paper adds some contributions for a Nothing On Insulator (NOI) nano-triode. The concept was introduced first time in 2018. The NOI-nano-triode has the advantages as: reduced sizes as a NOI transistor, a seriously improved subthreshold slope from 650/dec of an experimental vacuum transistor to 210mV/dec of the simulated NOI-nano-triode. The paid price is a non-null gate current. Besides to the optimal architecture with minimum SS parameter, the paper presents a technological flow for this device, aided by Athena tool.