Richard L. Donze, J. Sanders, M. Jenkins, G. Sporzynski
{"title":"PHILO - A VLSI Design System","authors":"Richard L. Donze, J. Sanders, M. Jenkins, G. Sporzynski","doi":"10.1145/800263.809202","DOIUrl":null,"url":null,"abstract":"This paper describes a design system capable of designing chips in the range of 5K to 7K equivalent three-way NOR gates. A key feature of the system is the ability to design chips with large macros (RAMs and PLAs). This design system is part of IBM's corporate-wide Engineering Design System (EDS). EDS provides the capabilities of logic simulation, automatic placement and wiring, checking, and test pattern generation [1]. This paper describes the key capabilities of the system, specifically as applied to IBM's silicon gate process. Topics covered include a description of the chip image and circuits, the automatic generation of large macros, the automatic placement and interconnection of circuits and macros, and a delay calculator/optimizer.","PeriodicalId":290739,"journal":{"name":"19th Design Automation Conference","volume":"5 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"7","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"19th Design Automation Conference","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1145/800263.809202","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 7
Abstract
This paper describes a design system capable of designing chips in the range of 5K to 7K equivalent three-way NOR gates. A key feature of the system is the ability to design chips with large macros (RAMs and PLAs). This design system is part of IBM's corporate-wide Engineering Design System (EDS). EDS provides the capabilities of logic simulation, automatic placement and wiring, checking, and test pattern generation [1]. This paper describes the key capabilities of the system, specifically as applied to IBM's silicon gate process. Topics covered include a description of the chip image and circuits, the automatic generation of large macros, the automatic placement and interconnection of circuits and macros, and a delay calculator/optimizer.