The solid solutions (AIII) PxAs1−x: Mechanism of formation the V group sublattise composition

E. A. Emelyanov, M. A. Putyato, B. Semyagin, D. Feklin, V. Preobrazhenskii
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Abstract

The influence of substrate temperature, density of As2, P2 molecules and Ga atoms flows on solid solutions AlPxAs1-x(001), GaPxAs1-x(001) and InPxAs1-x(001) composition at molecular-beam epitaxy (MBE) was investigated. The analysis of experimental data obtained in a wide range of growth conditions was carried out. The results of analysis are presented as a kinetic model describing the formation process of solid solution (AIII)PxAs1-x composition by MBE. The model can be used in the choice of growth conditions for solid solutions (AIII)PxAs1-x(001) layers with a set part of phosphor.
固溶体(AIII) PxAs1−x: V基亚位化合物的形成机理
研究了衬底温度、As2、P2分子密度和Ga原子流动对分子束外延(MBE)中固溶体AlPxAs1-x(001)、GaPxAs1-x(001)和InPxAs1-x(001)组成的影响。对在各种生长条件下得到的实验数据进行了分析。分析结果作为MBE描述固溶体(AIII)PxAs1-x组分形成过程的动力学模型。该模型可用于具有一定比例荧光粉的固溶体(AIII)PxAs1-x(001)层生长条件的选择。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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