Analysis of the steady and transient characteristics of the leakage current in GaAs integrated circuits

J. Gual, J. Samitier, J. Morante
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Abstract

We report a general model that allow us to analyze and simulate the steady and transient behavior of the leakage current between near devices in III-V integrated circuits. The model assumes the existence of a non-linear generation recombination process, impact ionization of deep traps, causing a non-equilibrium phase transition between a high resistive state and a conductive one.
GaAs集成电路中泄漏电流的稳态和瞬态特性分析
我们报告了一个通用模型,使我们能够分析和模拟III-V集成电路中近器件之间的泄漏电流的稳态和瞬态行为。该模型假定存在一个非线性的生成复合过程,即深阱的冲击电离,导致高阻态和导电态之间的非平衡相变。
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