The Effect of Thermal Annealing on the Optical Band Gap of Cd1-xZnxS Thin Films Deposited by the Dip Technique

D. Ompong, K. Ampong, F. Boakye
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引用次数: 2

Abstract

The effect of thermal annealing on the optical band gap of Cd1-xZnxS (x= 0.2, 0.4, 0.6, 0.8) thin films have been investigated. The films were deposited using the dip technique. The fundamental optical property which has been investigated here is the absorbance of light at room temperature, using the KLB Ultraspec II 4050 (UV/Visible) spectrophotometer over the wavelength range 300 – 900 nm. The energy band gap and absorption coefficient of the films were determined from the absorption spectrum. The optical band gap of the as-deposited films varied from 2.42 eV (x =0.2) to 3.61 eV (x =0.8), that is, the band gap increased with increasing Zn concentration of the alloy. These values compare favorably well with that obtained from literature of similar films prepared using other deposition techniques. The as-deposited samples were thermally annealed in air for an hour at temperatures of 100°C, 200°C and 300°C and the absorption spectra again recorded. It was observed that thermal annealing decreased the band gap of the samples; this may be due to improving crystallinity or alternatively, a phase transformation taking place in the samples as a result of the heat treatment.
热退火对浸镀Cd1-xZnxS薄膜光学带隙的影响
研究了热退火对Cd1-xZnxS (x= 0.2, 0.4, 0.6, 0.8)薄膜光学带隙的影响。采用浸镀技术沉积薄膜。这里研究的基本光学性质是在室温下,使用KLB Ultraspec II 4050 (UV/可见光)分光光度计,波长范围为300 - 900 nm。利用吸收光谱测定了薄膜的能带隙和吸收系数。沉积膜的光学带隙在2.42 eV (x =0.2) ~ 3.61 eV (x =0.8)之间变化,即带隙随合金Zn浓度的增加而增大。这些值与用其他沉积技术制备的类似薄膜的文献所获得的值相比较有利。将沉积后的样品在空气中分别于100℃、200℃和300℃温度下热退火1小时,再次记录吸收光谱。结果表明,热处理使样品的带隙减小;这可能是由于结晶度的提高,或者由于热处理,样品中发生了相变。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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