Enhancement of Vacuum Reflow Process for CCPAK - A Solution to Oxidized Lead Frame

Ramices Sanchez, Joshua Manguiat, Francis Louise Fajardo
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Abstract

With the development of high-power packages as a solution to customer needs and requirements, the CCPAK was introduced to fill the performance gap. A GaN (Gallium Nitride) is packaged with a silicon FET (Field Effect Transistor) and integrated with copper clip technology. This complex technology required process development, especially for the die attach clip attach process. In the initial CCPAK DACA characterization, visible evidence of lead frame oxidation was noted at the vacuum reflow process. As excessive lead frame oxidation is detrimental to package integrity and unlikely to occur in a vacuum state, the team decided to employ the DMAIC approach in systematically resolving this issue. Process elimination was conducted to pin down the problematic process from through the SIPOC diagram to understand, identify, and describe the failure. Monthly occurrence of oxidized lead frame was examined. Simulations were executed to validate the most possible cause of oxidation, which was the displacement of carrier on the heater block during the reflow process. Characterization was conducted, focusing on control of carrier movement during process. Initial results and prolonged performance were monitored. With the appropriate solution in placed, full elimination of lead frame oxidation was achieved resulting to yield improvement. Furthermore, the importance of proper process development prior production release was given emphasis.
氧化引线架CCPAK - A溶液真空回流工艺的改进
随着高功率封装作为客户需求和要求的解决方案的发展,CCPAK被引入以填补性能差距。GaN(氮化镓)封装在硅场效应晶体管(场效应晶体管)中,并集成了铜夹技术。这种复杂的技术需要工艺开发,特别是模具贴夹贴夹工艺。在最初的CCPAK DACA表征中,在真空回流过程中注意到引线框架氧化的明显证据。由于引线框架过度氧化对封装完整性有害,并且在真空状态下不太可能发生,因此该团队决定采用DMAIC方法系统地解决这一问题。过程消除是通过SIPOC图来确定有问题的过程,以理解、识别和描述故障。每月检查铅框氧化的发生情况。模拟验证了氧化最可能的原因,即在回流过程中载体在加热器块上的位移。进行了表征,重点研究了过程中载体运动的控制。对初始结果和长期性能进行了监测。在适当的溶液中,完全消除了引线框氧化,从而提高了收率。此外,还强调了在产品发布之前进行适当工艺开发的重要性。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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