A study of combining FIB circuit edit and OBIRCH technology for failure analysis

Abstract

This paper discusses combining Focused Ion Beam (FIB) circuit edit with OBIRH technology. FIB can cut or rewire an integrated circuit. OBIRCH can locate failure location. If FIB circuit edit & OBIRCH were applied at the same time, we can locate the failure site and find the root cause of the failure. The paper will share one case of failure analysis and present advanced FIB technology.