High temperature defect structure of Cd- and Te-rich CdTe

R. Grill, J. Franc, P. Hőschl, I. Turkevych, E. Belas, P. Moravec, M. Fiederle, K. Benz
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引用次数: 50

Abstract

The quasichemical formalism is used to evaluate simultaneously high temperature (600-1000/spl deg/C) in-situ conductivity and Hall effect measurements and tellurium atom fraction in CdTe along a three-phase curve. We show, that the electrical properties can be described only by two native defects-the cadmium interstitial being divalent donor and the cadmium vacancy as a divalent acceptor. Close to the three-phase line other native defects must be involved in the model to allow deviation from stoichiometry irrespective to the low density of electrically charged defects. A deep divalent donor Te/sub Cd/ having both levels near or below the midgap describes best all high temperature experimental data.
富镉、富te碲化镉的高温缺陷结构
采用准化学形式,沿三相曲线同时评价了高温(600-1000/spl℃)原位电导率、霍尔效应测量值和碲原子分数。我们发现,电学性质只能用两种天然缺陷来描述——镉间隙作为二价供体和镉空位作为二价受体。在接近三相线的地方,必须在模型中加入其他天然缺陷,以允许偏离化学计量,而不考虑带电缺陷的低密度。深二价给体Te/亚Cd/在中隙附近或以下都具有两个能级,最好地描述了所有高温实验数据。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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