Computational patterning and process variation impact on photonics devices

Abstract

With the introduction of Augmented Reality, Virtual Reality, and Mixed Reality (AR/VR/MR) applications, the fabrication of photonics devices is approaching a high volume manufacturing level. To scale these products to consumer friendly dimensions, there is still significant shrink needed for many not yet available components such as ultrasmall cameras, metalenses, microdisplays, and combiner optics. AR/VR/MR optical components include metalenses patterned over large areas, and the fidelity of these patterns may have a significant impact on performance. In this study, we apply OPC to the design intent and examine the implication of various lithographic and correction techniques on metalens performance through simulation. In addition, we investigate the root causes of the manufacturing process variability and its impact on metalens functionality. These devices are analyzed by comparing light propagation through the simulated manufactured system using rigorous lithographic models to the optimal system based on the design intent. The study finds that the size and shape of meta-atoms have a different impact on optical performance, depending on the type of the metalens.