Fabrication of 3-dimensional microstructures using moving mask deep X-ray lithography (M/sup 2/DXL)

Abstract

Two methods, "Forward Approach" and "Inverse Approach", to fabricate complicated 3-dimensional microstructures by deep X-ray lithography have been developed. In the "Forward Approach", exposure energy distribution on a PMMA substrate was calculated using X-ray mask pattern and mask moving trajectories. Two different micro-nozzle patterns were fabricated to demonstrate the feasibility of this approach. From the comparison between prediction and experiment, a new phenomenon related to the long lifetime radicals was observed. As the "Inverse Approach", a method to determine the optimum mask moving trajectory using Fourier transformation was developed.