Flexible and transparent ReRAM with GZO-memory-layer and GZO-electrodes on large PEN sheet

Abstract

Fabrication of flexible transparent ReRAM consisting of the GZO memory layer and GZO-electrodes on the PEN sheet with large area was attained by the introduction of the RF plasma assist DC magnetron sputtering method. Resistive switching mechanism of all-GZO-FT-ReRAM can be explained by the redox model as well as that of conventional binary transition metal oxides. Reset switching of all-GZO-FT-ReRAM which memory layer is GZO(RH2=5%) is smooth and continuous, which enables the verify operation and the multilevel application.