Influence of annealing temperature on sensing properties of TIOx thin films prepared by magnetron sputtering

Paulina Kapuścik, Ewa Mankowska, D. Wojcieszak
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Abstract

This work describes the influence of the annealing temperature on the optical and surfaceproperties of non-stoichiometric titanium oxide (TiOx) thin films. The results were related to theinvestigation of the sensing response toward H2 gas. The samples were prepared by the magnetronsputtering method using Ar:O2 plasma with low oxygen content (20% and 30%). An increase in theamount of oxygen in the gas mixture supplied to the magnetron led to a decrease in the deposition rate.The thickness of the deposited thin films, determined by the use of an optical profiler, was found tobe 600 nm and 200 nm, respectively. The coatings were then annealed in an ambient air atmosphereat a temperature in the range from 100C to 800C. Additionally, the roughness of the coating surfacewas measured. To investigate the optical properties of the thin films, transmission and reflection spectrawere measured, and parameters such as transmission coefficient, cutoff wavelength value, and opticalband gap value were determined as functions of the annealing temperature. The sensing propertiesof the thin films were characterised on the basis of changes in a resistance value as a response to amix of Ar:3.5% H2. It was found that the oxidation of the thin films has a key influence not only onthe response time of the TiOx thin films, but also on the character of the response.Keywords: materials engineering, titanium oxides, thin films, magnetron sputtering, optical properties,gas sensing properties
退火温度对磁控溅射制备TIOx薄膜传感性能的影响
本文描述了退火温度对非化学计量氧化钛(TiOx)薄膜光学性能和表面性能的影响。结果与对氢气的传感响应的研究有关。采用低氧含量(20%和30%)的Ar:O2等离子体,采用磁控溅射法制备样品。提供给磁控管的混合气体中氧气量的增加导致沉积速率的降低。利用光学剖面仪测定了沉积薄膜的厚度,分别为600 nm和200 nm。然后将涂层在环境空气中退火,温度范围从100℃到800℃。此外,还测量了涂层表面的粗糙度。为了研究薄膜的光学性质,测量了透射光谱和反射光谱,并确定了透射系数、截止波长值和光学带隙值等参数随退火温度的变化规律。薄膜的传感性能是基于响应Ar:3.5% H2的混合物的电阻值的变化来表征的。结果表明,薄膜的氧化不仅对TiOx薄膜的响应时间有重要影响,而且对响应特性也有重要影响。关键词:材料工程,氧化钛,薄膜,磁控溅射,光学性能,气敏性能
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