Nanometre technology's impact on design signoff

J. Brunet, B. Graupp
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Abstract

The move to smaller geometries continues its relentless march. Although it allows for higher transistor counts, nanometre scaling has the potential to severely inhibit the path to achieve sustainable yield. To address the challenges of moving to smaller and smaller nanometre technologies there must be an overhaul in how designs are created and manufactured. As more design starts shift to 130nm and below, the use of resolution enhancement technology (RET) is becoming quite prevalent and well understood. Next-generation RET technology will make the 45nm designs printable but comes at the cost of more complex models and correction techniques that can deal with variations across the process window.
纳米技术对设计签名的影响
向更小几何形状的转变仍在继续。虽然它允许更高的晶体管数量,但纳米尺度有可能严重抑制实现可持续产量的途径。为了解决向越来越小的纳米技术转移的挑战,必须对设计的创建和制造方式进行彻底改革。随着越来越多的设计开始转向130nm及以下,分辨率增强技术(RET)的使用变得相当普遍和容易理解。下一代RET技术将使45纳米设计可打印,但代价是更复杂的模型和校正技术,这些技术可以处理整个工艺窗口的变化。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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