{"title":"Nanometre technology's impact on design signoff","authors":"J. Brunet, B. Graupp","doi":"10.1049/ESS:20070206","DOIUrl":null,"url":null,"abstract":"The move to smaller geometries continues its relentless march. Although it allows for higher transistor counts, nanometre scaling has the potential to severely inhibit the path to achieve sustainable yield. To address the challenges of moving to smaller and smaller nanometre technologies there must be an overhaul in how designs are created and manufactured. As more design starts shift to 130nm and below, the use of resolution enhancement technology (RET) is becoming quite prevalent and well understood. Next-generation RET technology will make the 45nm designs printable but comes at the cost of more complex models and correction techniques that can deal with variations across the process window.","PeriodicalId":132835,"journal":{"name":"Electronic Systems and Software","volume":"6 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2007-05-29","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Electronic Systems and Software","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1049/ESS:20070206","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
The move to smaller geometries continues its relentless march. Although it allows for higher transistor counts, nanometre scaling has the potential to severely inhibit the path to achieve sustainable yield. To address the challenges of moving to smaller and smaller nanometre technologies there must be an overhaul in how designs are created and manufactured. As more design starts shift to 130nm and below, the use of resolution enhancement technology (RET) is becoming quite prevalent and well understood. Next-generation RET technology will make the 45nm designs printable but comes at the cost of more complex models and correction techniques that can deal with variations across the process window.