{"title":"Reflectance of Aluminum Reflectors in the Extreme Ultraviolet","authors":"M. L. Scott","doi":"10.1364/swcr.1988.od322","DOIUrl":null,"url":null,"abstract":"We have investigated a new concept in retro-reflectors for use in the extreme ultraviolet, namely, UHV aluminum coated, multi-facet, grazing-incidence mirrors. Our results indicate that this type of mirror, which utilizes total-external-reflectance, works very well in the wavelength range from 35 nm to 100 nm (89 ± 3% measured retroreflectance at 58.4 nm for a 9-facet mirror). However, the coated mirror surfaces must not be allowed to oxidize after deposition, which implies that the retro-reflector must be coated and used in situ or the oxide layer must be removed in a ultra-high vacuum (UHV) system.","PeriodicalId":190758,"journal":{"name":"Short Wavelength Coherent Radiation: Generation and Applications","volume":"93 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1988-11-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"3","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Short Wavelength Coherent Radiation: Generation and Applications","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1364/swcr.1988.od322","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 3
Abstract
We have investigated a new concept in retro-reflectors for use in the extreme ultraviolet, namely, UHV aluminum coated, multi-facet, grazing-incidence mirrors. Our results indicate that this type of mirror, which utilizes total-external-reflectance, works very well in the wavelength range from 35 nm to 100 nm (89 ± 3% measured retroreflectance at 58.4 nm for a 9-facet mirror). However, the coated mirror surfaces must not be allowed to oxidize after deposition, which implies that the retro-reflector must be coated and used in situ or the oxide layer must be removed in a ultra-high vacuum (UHV) system.