The synthesis and imaging study of a series of novel photoactive polymers with diazoketo groups in their side chains

Lithography Asia Pub Date : 2009-12-03 DOI:10.1117/12.839549
Lu Liu, Yingquan Zou, Yuchun Yang, Yong Huang, Qisheng Liu, Huinan Niu
{"title":"The synthesis and imaging study of a series of novel photoactive polymers with diazoketo groups in their side chains","authors":"Lu Liu, Yingquan Zou, Yuchun Yang, Yong Huang, Qisheng Liu, Huinan Niu","doi":"10.1117/12.839549","DOIUrl":null,"url":null,"abstract":"A kind of photoactive polymer with diazoketo groups in its side chains has been reported in SPIE and other related papers, and this photoactive polymer can be used in deep UV non-CARs (non-chemically amplified resists) system. Based on the work above, a series of novel photoactive monomers with substituents like phenyl, p-methylphenyl, p-methoxyphenyl, p-dimethylaminophenyl on the end of the molecule are designed and synthesized. By changing their substituents, the maximum-absorption wavelength of the photoactive monomers has been moved to 356nm, and it still has comparatively large absorption at 365nm (I-line). A series of photoactive polymers were obtained by polymerizing the monomer with methyl methacrylate and 2-hydroxyethyl methacrylate together. Upon irradiaton in the waveleng of 365nm, the diazoketo groups which are in the side chains of the photoactive polymers undergo the wolff rearrangment and afford ketens that react with water to provide base-soluble photoproducts. Applying this kind of photoactive polymers to non-CARs, a positive image can be obtained. This kind of photoactive polymers have great value in I-line non-CARs, TFT-LCD and IC discrete devices processing. And its anti-dry etching ability is enhanced by the introduction of the benzene ring.","PeriodicalId":383504,"journal":{"name":"Lithography Asia","volume":"37 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2009-12-03","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Lithography Asia","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1117/12.839549","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 1

Abstract

A kind of photoactive polymer with diazoketo groups in its side chains has been reported in SPIE and other related papers, and this photoactive polymer can be used in deep UV non-CARs (non-chemically amplified resists) system. Based on the work above, a series of novel photoactive monomers with substituents like phenyl, p-methylphenyl, p-methoxyphenyl, p-dimethylaminophenyl on the end of the molecule are designed and synthesized. By changing their substituents, the maximum-absorption wavelength of the photoactive monomers has been moved to 356nm, and it still has comparatively large absorption at 365nm (I-line). A series of photoactive polymers were obtained by polymerizing the monomer with methyl methacrylate and 2-hydroxyethyl methacrylate together. Upon irradiaton in the waveleng of 365nm, the diazoketo groups which are in the side chains of the photoactive polymers undergo the wolff rearrangment and afford ketens that react with water to provide base-soluble photoproducts. Applying this kind of photoactive polymers to non-CARs, a positive image can be obtained. This kind of photoactive polymers have great value in I-line non-CARs, TFT-LCD and IC discrete devices processing. And its anti-dry etching ability is enhanced by the introduction of the benzene ring.
一系列具有侧链重氮酮基团的新型光活性聚合物的合成和成像研究
SPIE等相关文献报道了一种侧链含有重氮酮基团的光活性聚合物,该聚合物可用于深紫外非化学放大抗蚀剂体系。在此基础上,设计并合成了一系列新型光活性单体,其末端具有苯基、对甲基苯基、对甲氧基苯基、对二甲氨基苯基等取代基。通过改变取代基,光活性单体的最大吸收波长移至356nm,在365nm处仍有较大的吸收(i线)。将该单体与甲基丙烯酸甲酯和甲基丙烯酸2-羟乙酯聚合,得到了一系列光活性聚合物。在365nm波长照射下,光活性聚合物侧链上的重氮酮基团发生沃尔夫重排,并产生与水反应的酮,产生碱溶性光产物。将这种光活性聚合物应用于非car上,可以获得正像。这种光活性聚合物在i线非car、TFT-LCD和IC分立器件加工中具有重要的应用价值。苯环的引入提高了其抗干腐蚀能力。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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