Bulk growth of compositionauy homogeneous III-V ternary anoys

P. Dutta, A. Kumar, A. Chandola, R. Pino, H. Kim, A. Dighe
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Abstract

Substrates of ternary compound semiconductors such as GaInSb, GaInAs, InPAs, GaInP, etc. are of particular interest for electronic and optoelectronic devices. The main technical challenge in growing bulk crystals of ternary alloys is mechanical cracking of crystals due to spatial compositional inhomogeneity [ 1-41. Cracking can be eliminated by ensuring radial compositional uniformity in the crystals. A planar melt-solid interface shape during growth is necessary in maintaining radial composition uniformity. Due to inherent alloy segregation dictated by the pseudo-binary phase diagrams, the growth interface shift towards the lower temperatures. Hence if the external temperature gradient imposed by the furnace remains constant, the growth interface shape can change from convex to concave during growth. Temperature gradient and growth rate manupulation, proper melt mixing using forced convection have been found to be effective in maintaining radial homogeneity [5]. Furthermore, if the alloy composition in the melt is kept at a constant composition level, the growth interface will automatically remain flat, convex or concave depending on its initial shape. Solute feeding via double crucible technique has been attempted by previous researchers to grow uniform crystals [3,4]. However, double crucible method is suitable only for dilute alloy compositions due to technical difficulties. In this paper, we have described a self-solute feeding method wherein homogeneous ternary crystals of any desired composition could be grown by taking advantage of the fundamental solute diffusion properties in the melt [6].
复合均相III-V三元合金的体生长
三元化合物半导体衬底,如GaInSb、GaInAs、InPAs、GaInP等,是电子和光电子器件特别感兴趣的材料。三元合金体晶生长的主要技术挑战是由于空间成分的不均匀性导致晶体的机械开裂[1-41]。通过保证晶体径向成分的均匀性,可以消除裂纹。在生长过程中,一个平面的熔固界面形状是保持径向成分均匀性所必需的。由于伪二元相图所指示的固有合金偏析,生长界面向较低温度方向移动。因此,如果炉膛施加的外部温度梯度保持不变,生长界面形状可以在生长过程中由凸变为凹。控制温度梯度和生长速率,利用强制对流进行适当的熔体混合,可以有效地保持径向均匀性。此外,如果熔体中的合金成分保持在恒定的成分水平,则生长界面将根据其初始形状自动保持平坦,凸或凹。以前的研究人员已经尝试过通过双坩埚技术喂入溶质来生长均匀的晶体[3,4]。然而,由于技术上的困难,双坩埚法只适用于稀合金成分。在本文中,我们描述了一种自溶质进料方法,其中可以利用熔体中溶质扩散的基本特性来生长任何所需成分的均质三元晶体。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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