QLC Programmable 3D Ferroelectric NAND Flash Memory by Memory Window Expansion using Cell Stack Engineering

Sunghyun Yoon, Sung I. Hong, Daehyun Kim, Garam Choi, Young Mo Kim, Kyunghoon Min, Seiyon Kim, Myung-Hee Na, Seonyong Cha
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引用次数: 1

Abstract

3D ferroelectric NAND (Fe-NAND) Quad-level cell (QLC) operation has been demonstrated for the first time to our knowledge, using the 3D CTN NAND test vehicle for mass production. The 3D Fe-NAND is optimized by engineering the cell stack layers, enlarging a program/erase (PE) window up to 10.5 V. QLC operation is successfully verified with the minimum gap margin of 0.24 V. Endurance and data retention characteristics are also reported.
基于Cell Stack工程的QLC可编程3D铁电NAND闪存
据我们所知,3D铁电NAND (Fe-NAND)四能级电池(QLC)的操作首次得到了演示,使用3D CTN NAND测试车进行了批量生产。3D Fe-NAND通过设计单元堆叠层进行优化,将程序/擦除(PE)窗口扩大到10.5 V。QLC运行成功,最小间隙裕度为0.24 V。耐久性和数据保留特性也被报道。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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