Theoretical approach to the stoichiometric feature of field emission from Al/sub x/Ga/sub 1-x/N

T. S. Choi, M. Chung
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Abstract

The field emission current density j from the ternary alloy Al/sub x/Ga/sub 1-x/N is calculated as a function of a stoichiometric composition x for 0/spl les/x/spl les/1. In addition to the doping, the internal field emission is considered to contribute to the carrier concentration n of the conduction band of Al/sub x/Ga/sub 1-x/N. A full calculation is made to obtain the exact j from Al/sub x/Ga/sub 1-x/N as a function of x and the field F. Then we found the stoichiometric dependence of field emission from Al/sub x/Ga/sub 1-x/N by analyzing the effects of both the electron affinity and the carrier concentration.
Al/sub -x/ Ga/sub - 1-x/N场发射化学计量特征的理论探讨
计算了三元合金Al/sub x/Ga/sub 1-x/N在0/spl les/x/spl les/1时的场发射电流密度j作为化学计量成分x的函数。除掺杂外,内场发射被认为对Al/sub x/Ga/sub 1-x/ n导带载流子浓度n有贡献。通过对Al/sub x/Ga/sub - 1-x/N的场发射的化学计量学分析,得到了Al/sub x/Ga/sub - 1-x/N的场发射随x和场f的变化规律。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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