The Effect of Gate Stack and High-ĸ Spacer on Device Performance of a Junctionless GAA FinFET

Abstract

In this work, we investigated the effect of the gate stack and high-ĸ gate spacers on the digital and analog performance of a lightly doped n-type Si channel Junctionless Rectangular Gate All Around (JL-Re-GAA) FinFET. Different digital and analog parameters, for instance, drain current (Id), leakage current (Ioff), switching ratio (Ion/Ioff), subthreshold swing (SS), transconductance (gm), output conductance (gd), transconductance generation factor (TGF), intrinsic gain (Av), early voltage (VEA) have been analyzed. From the simulated results obtained, we have found that the use of gate stack and high-ĸ gate spacers remarkably improves the digital and analog figures of merits (FOMs) of the device. Thus, the JL-Re-GAA FinFET structure with high-k gate spacers and gate stack can be considered as a suitable candidate in digital and analog circuit applications.