Layout verification to improve ESD/latchup immunity of scaled-down CMOS cell libraries

M. Ker, Sue-Mei Hsiao, Jiann-Horng Lin
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Abstract

Layout verification has been proposed to improve the ESD (Electrostatic Discharge) and latchup immunity of scaled-down CMOS cell libraries. By using the DRC (design rules check) and ERC (electrical rules check), the ESD/latchup sensitive layout can be found. By changing the layout in the suggested way of high immunity to ESD and latchup without increasing the layout area of the cells, the ESD and latchup reliability of CMOS IC's assembled by the layout-verified cell libraries can be significantly improved.
布局验证,以提高缩小CMOS单元库的ESD/闭锁抗扰度
为了提高微缩CMOS单元库的ESD(静电放电)和闭锁抗扰度,提出了布局验证方法。通过DRC(设计规则检查)和ERC(电气规则检查),可以找到ESD/闭锁敏感布局。在不增加单元的布局面积的情况下,以高抗ESD和闭锁的方式改变布局,可以显著提高由经过布局验证的单元库组装的CMOS IC的ESD和闭锁可靠性。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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