B. Paul, A. Bansal, K. Roy
{"title":"Underlap DGMOS for ultra-low power digital sub-threshold operation","authors":"B. Paul, A. Bansal, K. Roy","doi":"10.1109/DRC.2005.1553132","DOIUrl":null,"url":null,"abstract":"Inthis paperwe analyze theimpact ofgateunderlap on theeffective capacitance ofDoubleGateMOS (DGMOS) transistor fordigital sub-threshold operation. Results onaring oscillator showthat withoptimum underlap 40%improvement indelay canbeachieved with7.3Xreduction inpowerdelay product (PDP). I.Introduction Sub-threshold leakage current canbeusedinapplications requiring ultra-low powerconsumption withlowtomedium (tentohundreds ofmegahertz) frequency ofoperation [1], e.g.cellphones, PDA,pacemaker etc.DoublegateMOS (DGMOS)transistors aresuitable forsub-threshold operation (VDD < VTH(Fig. 1)) duetotheir nearideal sub-threshold slope andnegligible intrinsic capacitance [2]. Inthis paper we investigate theeffectiveness ofthegateunderlap inDGMOS device forfurther minimizing powerconsumption indigital sub-threshold operation. Unlike super-threshold operation, the intrinsic capacitance oftheDGMOS operated inthesubthreshold region isnegligible andisveryweakly dependent onthechannel length [2]. Hence, theeffective capacitance (CG) inthesub-threshold region isdominated bytheparasitic capacitance. We showthat withoptimum gateunderlap the parasitic capacitances ofDGMOScanbesignificantly reduced, whichinturn leads tolower circuit powerconsumption.","PeriodicalId":306160,"journal":{"name":"63rd Device Research Conference Digest, 2005. DRC '05.","volume":"47 1 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2005-06-20","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"10","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"63rd Device Research Conference Digest, 2005. DRC '05.","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/DRC.2005.1553132","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 10
超低功耗数字亚阈值操作的覆盖式DGMOS
本文分析了栅极搭接对双栅极(DGMOS)晶体管数字亚阈值工作有效电容的影响。结果表明,在最优的欠接情况下,延时提高了40%,功率延迟积(PDP)降低了7.3倍。一、介绍亚阈值泄漏电流可用于低中频(10 -数百兆赫)工作频率要求超低功耗的应用[1],如手机、PDA、起搏器等。双栅极晶体管(DGMOS)适用于亚阈值工作(VDD < VTH)。1))由于其近似亚阈值斜率和可忽略的固有电容[2]。在本文中,我们研究了gateunderlap的inDGMOS器件在数字亚阈值操作中进一步降低功耗的有效性。与超阈值操作不同,在亚阈值区域操作的dgmos的固有电容可以忽略不计,并且对通道长度的依赖性非常弱[2]。因此,亚阈值区域的有效电容(CG)由寄生电容主导。我们的研究表明,通过优化门电路覆盖,dgmos的寄生电容显著降低,从而降低了电路功耗。
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