T. Raker, H. Felsl, F. Niedernostheide, F. Pfirsch, H. Schulze
{"title":"Limits of strongly punch-through designed IGBTs","authors":"T. Raker, H. Felsl, F. Niedernostheide, F. Pfirsch, H. Schulze","doi":"10.1109/ISPSD.2011.5890800","DOIUrl":null,"url":null,"abstract":"We will focus on the turn-off behavior of strongly punch-through designed field-stop IGBTs. Our numerical simulations with a monolithic multi-cell structure show that the appearance of current filaments may limit the safe operating area (SOA) of very thin devices with a high resistivity of base material [1]. A detailed analysis of current densities and electric field distributions gives insight into the mechanisms resulting in the formation of current filaments. The limit for a filament-free turn-off behavior can be found in the thickness-vs.-resistivity phase diagram. It could be shown that also other device parameters, such as field-stop and p-emitter design, highly influence susceptibility for the appearance of current filaments during the turn-off phase.","PeriodicalId":132504,"journal":{"name":"2011 IEEE 23rd International Symposium on Power Semiconductor Devices and ICs","volume":"58 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2011-05-23","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"14","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2011 IEEE 23rd International Symposium on Power Semiconductor Devices and ICs","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ISPSD.2011.5890800","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 14
Abstract
We will focus on the turn-off behavior of strongly punch-through designed field-stop IGBTs. Our numerical simulations with a monolithic multi-cell structure show that the appearance of current filaments may limit the safe operating area (SOA) of very thin devices with a high resistivity of base material [1]. A detailed analysis of current densities and electric field distributions gives insight into the mechanisms resulting in the formation of current filaments. The limit for a filament-free turn-off behavior can be found in the thickness-vs.-resistivity phase diagram. It could be shown that also other device parameters, such as field-stop and p-emitter design, highly influence susceptibility for the appearance of current filaments during the turn-off phase.