{"title":"3D Nanofocusing plasmonic waveguide","authors":"H. Choo","doi":"10.1109/OMN.2014.6924523","DOIUrl":null,"url":null,"abstract":"We have demonstrated experimentally a highly efficient on-chip three-dimensional (3D) linearly tapered metal-insulator-metal (MIM) nanoplasmonic photon compressor (3D NPC) with a final aperture size of 14 × 80 nm2. An optimized and linearly tapered MIM gap plasmon waveguide could theoretically reduce the excessive losses that would occur during nanofocusing processes. In simulation study, this approach could enable nanofocusing into a 2 × 5 nm2 area with the coupling loss and maximum E2 enhancement of 2.5 dB and 3.0 × 104, respectively. We fabricated the 3D NPC on a chip employing electron beam-induced deposition and demonstrated its highly localized light confinement using a two-photon photoluminescence (TPPL) technique. From the TPPL measurements, we experimentally estimated an intensity enhancement of 400 within a 14 × 80 nm2 cross-sectional area and a coupling efficiency of -1.3 dB (or 74% transmittance).","PeriodicalId":161791,"journal":{"name":"2014 International Conference on Optical MEMS and Nanophotonics","volume":"15 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2014-10-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2014 International Conference on Optical MEMS and Nanophotonics","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/OMN.2014.6924523","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
We have demonstrated experimentally a highly efficient on-chip three-dimensional (3D) linearly tapered metal-insulator-metal (MIM) nanoplasmonic photon compressor (3D NPC) with a final aperture size of 14 × 80 nm2. An optimized and linearly tapered MIM gap plasmon waveguide could theoretically reduce the excessive losses that would occur during nanofocusing processes. In simulation study, this approach could enable nanofocusing into a 2 × 5 nm2 area with the coupling loss and maximum E2 enhancement of 2.5 dB and 3.0 × 104, respectively. We fabricated the 3D NPC on a chip employing electron beam-induced deposition and demonstrated its highly localized light confinement using a two-photon photoluminescence (TPPL) technique. From the TPPL measurements, we experimentally estimated an intensity enhancement of 400 within a 14 × 80 nm2 cross-sectional area and a coupling efficiency of -1.3 dB (or 74% transmittance).