3D Nanofocusing plasmonic waveguide

H. Choo
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Abstract

We have demonstrated experimentally a highly efficient on-chip three-dimensional (3D) linearly tapered metal-insulator-metal (MIM) nanoplasmonic photon compressor (3D NPC) with a final aperture size of 14 × 80 nm2. An optimized and linearly tapered MIM gap plasmon waveguide could theoretically reduce the excessive losses that would occur during nanofocusing processes. In simulation study, this approach could enable nanofocusing into a 2 × 5 nm2 area with the coupling loss and maximum E2 enhancement of 2.5 dB and 3.0 × 104, respectively. We fabricated the 3D NPC on a chip employing electron beam-induced deposition and demonstrated its highly localized light confinement using a two-photon photoluminescence (TPPL) technique. From the TPPL measurements, we experimentally estimated an intensity enhancement of 400 within a 14 × 80 nm2 cross-sectional area and a coupling efficiency of -1.3 dB (or 74% transmittance).
三维纳米聚焦等离子体波导
我们通过实验证明了一种高效的片上三维(3D)线性锥形金属-绝缘体-金属(MIM)纳米等离子体光子压缩器(3D NPC),其最终孔径尺寸为14 × 80 nm2。理论上,一种优化的线性锥形MIM间隙等离子体波导可以减少纳米聚焦过程中产生的过多损耗。在模拟研究中,该方法可以使纳米聚焦在2 × 5 nm2的区域内,耦合损耗和最大E2增强分别为2.5 dB和3.0 × 104。我们利用电子束诱导沉积技术在芯片上制备了三维NPC,并利用双光子光致发光(TPPL)技术证明了其高度局域化的光约束。从TPPL测量中,我们实验估计在14 × 80 nm2横截面积内强度增强了400,耦合效率为-1.3 dB(或74%透过率)。
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