Ternary volatile random access memory based on heterogeneous graphene-CMOS fabric

S. Khasanvis, K. Habib, Mostafizur Rahman, P. Narayanan, R. Lake, C. A. Moritz
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引用次数: 6

Abstract

Graphene is an emerging nano-material that has garnered immense research interest due to its exotic electrical properties. It is believed to be a potential candidate for post-Si nanoelectronics due to high carrier mobility and extreme scalability. Recently, a new graphene nanoribbon crossbar (xGNR) device was proposed which exhibits negative differential resistance (NDR). In this paper, we present an approach to realize multistate memories, enabled by these graphene crossbar devices. We propose a ternary graphene nanoribbon tunneling volatile random access memory (GNTRAM) and implement it using a heterogeneous integration with CMOS transistors and routing. Benchmarking is presented with respect to state-of-the-art CMOS SRAM and 3T DRAM designs. Ternary GNTRAM shows up to 1.77x density-per-bit benefit over CMOS SRAMs and 1.42x benefit over 3T DRAM in 16nm technology node. Ternary GNTRAM is also up to 9x more power-efficient per bit against low-power CMOS SRAMs during stand-by, while maintaining comparable performance to high-performance designs. Thus GNTRAM has the potential to realize ultra-dense nanoscale memories exceeding those achievable by mere physical scaling. Further improvements may be possible by using graphene more extensively, as graphene transistors become available in future.
基于非均质石墨烯- cmos结构的三元易失性随机存取存储器
石墨烯是一种新兴的纳米材料,由于其奇异的电学特性而获得了巨大的研究兴趣。由于高载流子迁移率和极高的可扩展性,它被认为是后si纳米电子学的潜在候选者。最近,提出了一种具有负差分电阻(NDR)的新型石墨烯纳米带交叉棒(xGNR)器件。在本文中,我们提出了一种实现多态存储器的方法,该方法由这些石墨烯交叉棒器件实现。我们提出了一种三元石墨烯纳米带隧道易失性随机存取存储器(GNTRAM),并使用CMOS晶体管和路由的异构集成来实现它。针对最先进的CMOS SRAM和3T DRAM设计提出了基准测试。在16nm技术节点上,三元GNTRAM比CMOS sram的每比特密度提高1.77倍,比3T DRAM的每比特密度提高1.42倍。在待机状态下,与低功耗CMOS sram相比,三元GNTRAM的每比特能效高达9倍,同时保持与高性能设计相当的性能。因此,GNTRAM有可能实现超密集的纳米级存储器,而不仅仅是物理缩放。随着石墨烯晶体管在未来变得可用,更广泛地使用石墨烯可能会进一步改进。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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