Epitaxy of Ge on offcut Si substrate for growth of In0.01Ga0.99As

Weixuan Hu, B. Cheng, C. Xue, S. Su, Zhi Liu, Yaming Li, Qiming Wang
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Abstract

Epitaxy of Ge on offcut Si (001) for growth of In0.01Ga0.99As was studied. Anti-phase domains were prevented in In0.01Ga0.99As layer except on the In0.01Ga0.99As/Ge interface. Threading dislocations of Ge deteriorate the quality of In0.01Ga0.99As remarkably.
锗在Si衬底上外延生长In0.01Ga0.99As
研究了Ge在Si(001)上外延生长In0.01Ga0.99As的过程。除In0.01Ga0.99As/Ge界面外,在In0.01Ga0.99As层中没有出现反相畴。Ge的螺纹位错使In0.01Ga0.99As的质量明显恶化。
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