p-GaN/AlGaN/GaN Enhancement-Mode HEMTs

C. Suh, A. Chini, Y. Fu, C. Poblenz, J. Speck, U. Mishra
{"title":"p-GaN/AlGaN/GaN Enhancement-Mode HEMTs","authors":"C. Suh, A. Chini, Y. Fu, C. Poblenz, J. Speck, U. Mishra","doi":"10.1109/DRC.2006.305167","DOIUrl":null,"url":null,"abstract":"GaN-based enhancement-mode (E-mode) HEMTs are attracting significant interest for integration of control circuitry and for the added safety of a normally-off device in power switching applications. While previous work reports excellent performance by gate-recessing' and Fluorine-based plasma treatment2, the Schottky gate turn-on voltage of these devices are at most 2 V. Because highpower switching applications require a threshold voltage of over 1 V for gate signal noise immunity, increasing the gate turn-on voltage is crucial. Utilization of p-GaN barrier below the gate3 depletes the channel and increases the gate turn-on voltage to 3 V, rendering it attractive for high-power applications. In this report we present a p-GaN/AlGaN/GaN E-mode HEMTs with a 3 V gate turn-on and maximum output current exceeding 0.3 A/mm. In addition, pulsed I-V measurement and small-signal performance of these devices are presented and the design space of p-GaN gated E-mode HEMTs are investigated for high-power switching applications.","PeriodicalId":259981,"journal":{"name":"2006 64th Device Research Conference","volume":"1 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2006-06-26","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"9","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2006 64th Device Research Conference","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/DRC.2006.305167","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 9

Abstract

GaN-based enhancement-mode (E-mode) HEMTs are attracting significant interest for integration of control circuitry and for the added safety of a normally-off device in power switching applications. While previous work reports excellent performance by gate-recessing' and Fluorine-based plasma treatment2, the Schottky gate turn-on voltage of these devices are at most 2 V. Because highpower switching applications require a threshold voltage of over 1 V for gate signal noise immunity, increasing the gate turn-on voltage is crucial. Utilization of p-GaN barrier below the gate3 depletes the channel and increases the gate turn-on voltage to 3 V, rendering it attractive for high-power applications. In this report we present a p-GaN/AlGaN/GaN E-mode HEMTs with a 3 V gate turn-on and maximum output current exceeding 0.3 A/mm. In addition, pulsed I-V measurement and small-signal performance of these devices are presented and the design space of p-GaN gated E-mode HEMTs are investigated for high-power switching applications.
基于氮化镓的增强模式(E-mode) hemt在控制电路集成和功率开关应用中正常关闭器件的安全性方面引起了极大的兴趣。虽然先前的工作报告了栅极凹槽和氟基等离子体处理的优异性能,但这些器件的肖特基栅极导通电压最多为2v。由于高功率开关应用需要超过1 V的阈值电压来抵抗栅极信号噪声,因此提高栅极导通电压至关重要。利用栅极3下方的p-GaN势垒耗尽通道并将栅极导通电压提高到3v,使其对大功率应用具有吸引力。在本报告中,我们提出了一种p-GaN/AlGaN/GaN e型hemt,其栅极导通电压为3v,最大输出电流超过0.3 a /mm。此外,还介绍了这些器件的脉冲I-V测量和小信号性能,并研究了用于大功率开关应用的p-GaN门控e模hemt的设计空间。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 求助全文
来源期刊
自引率
0.00%
发文量
0
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术官方微信