Substrate Inhibition Kinetics Models for Fitting the Growth Rate of Phenol by an Immobilized Pseudomonas putida

G. Uba, H. Yakasai, A. Abubakar
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Abstract

Phenol, in particular, is one of several dangerous synthetic compounds created by humans. There were more than 80,000 chemicals produced in the US for industrial use, and many of these are phenol and phenolic compounds that end up in the environment without being subjected to adequate safety assessment. There are several types of bacteria that may use phenol as a carbon source, making bioremediation of this dangerous material a promising possibility. We found that at very high concentrations of phenol, the growth rate of Pseudomonas putida NAUN-16 was significantly slowed down. The primary growth model modified Gompertz was utilized to obtain the growth parameter specific growth rate. In this study, we continue the work by further modelling the effect of substrate or phenol on the growth rate of the bacterium using several substrate inhibition kinetic models such as Monod, Haldane, Teissier, Aiba, Yano and Koga, Han and Levenspiel, Luong, Moser, Webb and Hinshelwood. The resultant fittings show appreciable fitting with the exception of the Monod model. The Teissier model, as opposed to the more widely used Haldane model, better suited the growth rate data at different concentrations of phenol as judged by the results of the RMSE, AICc, adjustedR2, F-test, and bias and accuracy factor. The designated values of the Teissier constants were maximal reduction rate, half saturation constant for maximal reduction and half inhibition constant which are symbolized by max, Ks and Ki were 0.150 1/hr (95% confidence interval 0.120 to 0.180), 162.19 mg/L (95% C.I.55.58 to 268.79) and 1291.94 mg/L (95% C.I. 1067.24 to 1516.65), respectively. The value generated from curve fitting interpolation should not be taken as the actual value and it should be warned of this as the true mumax should be where the gradient for the slope is zero and in this case the value was approximately 0.097 1/h at 385 mg/L phenol.
固定化恶臭假单胞菌拟合苯酚生长速率的底物抑制动力学模型
尤其是苯酚,它是人类制造的几种危险的合成化合物之一。美国生产了超过8万种用于工业用途的化学品,其中许多是苯酚和酚类化合物,它们最终没有经过充分的安全评估就进入了环境。有几种细菌可能利用苯酚作为碳源,这使得这种危险物质的生物修复成为一种很有希望的可能性。我们发现,在非常高的苯酚浓度下,恶臭假单胞菌NAUN-16的生长速度明显减慢。利用修正的Gompertz原始生长模型,得到了生长参数比生长速率。在这项研究中,我们继续通过使用几个底物抑制动力学模型(如Monod, Haldane, Teissier, Aiba, Yano和Koga, Han和Levenspiel, Luong, Moser, Webb和Hinshelwood)进一步模拟底物或苯酚对细菌生长速度的影响来继续这项工作。除莫诺模型外,所得到的拟合效果良好。从RMSE、AICc、adjusted dr2、f检验以及偏倚和精度因子的结果来看,与更广泛使用的Haldane模型相比,Teissier模型更适合不同苯酚浓度下的生长速率数据。Teissier常数的指定值为最大还原速率,最大还原的半饱和常数和半抑制常数,用max表示,Ks和Ki分别为0.150 1/hr(95%置信区间0.120 ~ 0.180),162.19 mg/L (95% ci .55.58 ~ 268.79)和1291.94 mg/L (95% ci . 1067.24 ~ 1516.65)。由曲线拟合插值产生的值不应该被当作实际值,应该被警告,因为真正的最大值应该是斜率的梯度为零的地方,在这种情况下,当苯酚浓度为385 mg/L时,该值约为0.097 1/h。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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