Annealing Effect of Sol-Gel TiO2 Thin Film on pH-EGFET Sensor

P. Yao, M. Lee, J. Chiang
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引用次数: 22

Abstract

In this study, a sol-gel titanium dioxide (TiO2) was spin-coated on indium tin oxide (ITO) substrate as a sensing membrane for the extended-gate field-effect transistor (EGFET). To improve its sensing properties, the resultant films were thermal annealed at various temperatures. It shows that, as TiO2 was post-annealed at Ta=200°C for 30 min, a highest pH sensitivity of 79.9 μA/pH was derived. As Ta > 500°C, the pH sensitivity was declined substantial to 70.1 μA/pH. The sensitivity would further deteriorate to 61.8 μA/pH as the annealing time extended to 90 min under identical Ta. These phenomena could be attributed to the less surface hydroxyl sites of TiO2 thin film at elevated Ta. X-ray diffractograms indicates that an amorphous titania resides as Ta <; 200°C which presents more surface hydroxyl sites than those of crystalline structures at elevated Ta. It reveals that the pH sensitivity of EGFET was relied on the density of the surface hydroxyl structures. To employ to the portable sensing devices with desirable pH sensitivity, the post annealing of the asdeposited TiO2 film is a crucial process.
溶胶-凝胶TiO2薄膜在pH-EGFET传感器上的退火效应
在本研究中,溶胶-凝胶二氧化钛(TiO2)被自旋涂覆在氧化铟锡(ITO)衬底上,作为扩展栅场效应晶体管(EGFET)的传感膜。为了提高其传感性能,在不同温度下对所得薄膜进行了热退火。结果表明,TiO2经Ta=200℃退火30 min后,pH灵敏度最高,为79.9 μA/pH。当Ta > 500℃时,pH敏感性大幅下降至70.1 μA/pH。在相同Ta下,当退火时间延长至90 min时,灵敏度进一步下降至61.8 μA/pH。这些现象可能是由于TiO2薄膜在高Ta下表面羟基位点较少。x射线衍射图表明,无定形二氧化钛以Ta <;在200°C时,表面羟基位置比在升高的Ta下的晶体结构多。结果表明,EGFET的pH敏感性取决于其表面羟基结构的密度。为了制备出具有理想pH灵敏度的便携式传感器件,沉积的TiO2薄膜的后退火是至关重要的过程。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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