Analytical threshold voltage model for short channel n/sup +/-p/sup +/ double-gate SOI MOSFETs

K. Suzuki, Y. Tosaka, T. Sugii
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引用次数: 54

Abstract

Previously, we proposed n/sup +/-p/sup +/ double-gate SOI MOSFETs, and fabricated this device, and demonstrated high-speed, low-power performance with a gate length L/sub G/ of 0.2 /spl mu/m. In this paper, we have derived a threshold voltage model V/sub th/ for short channel devices to predict how far this device can be scaled. Using this model, which agrees with numerical data, we evaluated V/sub th/ lowering /spl Delta/V/sub th/ with decreasing the gate length L/sub G/, and showed that we can design a 0.05 /spl mu/m-L/sub G/ device with /spl Delta/V/sub th/ of 25 mV and an S-swing of 65 mV/decade.
短通道n/sup +/-p/sup +/双栅SOI mosfet的解析阈值电压模型
在此之前,我们提出了n/sup +/-p/sup +/双栅极SOI mosfet,并制作了该器件,并证明了该器件具有高速,低功耗的性能,栅极长度L/sub G/为0.2 /spl mu/m。在本文中,我们推导了短通道器件的阈值电压模型V/sub /,以预测该器件可以缩放多远。利用该模型,我们对栅极长度L/sub G/减小时的V/sub /降低/spl Delta/V/sub /进行了计算,结果表明,我们可以设计出0.05 /spl μ /m-L/sub /器件,/spl Delta/V/sub /为25 mV, s摆幅为65 mV/ 10年。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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