RF and non-linearity characterization of porous silicon layer for RF-ICs

Y. Belaroussi, A. Slimane, M. Belaroussi, M. Trabelsi, G. Scheen, K. B. Ali, J. Raskin
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引用次数: 4

Abstract

Nanostructured porous silicon is very promising for RF applications by overcoming the high-frequency losses originating from the bulk silicon substrate. RF performance and non-linearity analysis of different silicon substrates including, porous (PSi), trap-rich (TR) high resistivity (HR) types are explored experimentally. The investigation is done by means of coplanar transmission lines (CPW) fabricated on these substrates. RF measurements of transmission lines demonstrate the successful reduction of the permittivity and increase of the resistivity of the PSi substrate. It also demonstrated that the insertion losses and linearity are efficiently enhanced.
射频集成电路中多孔硅层的射频和非线性特性
纳米结构多孔硅克服了本体硅衬底产生的高频损耗,在射频应用中具有很大的应用前景。通过实验研究了多孔(PSi)、富陷阱(TR)、高电阻率(HR)等不同类型硅衬底的射频性能和非线性分析。通过在这些衬底上制作共面传输线(CPW)来进行研究。传输线的射频测量证明了PSi衬底的介电常数的成功降低和电阻率的增加。结果表明,该方法有效地提高了插入损耗和线性度。
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