Study of the atomic and molecular radiation in shadow mask PDP

IVESC 2004. The 5th International Vacuum Electron Sources Conference Proceedings (IEEE Cat. No.04EX839) Pub Date : 2004-09-06 DOI:10.1109/IVESC.2004.1414188

Y. Tu, Lanlan Yang, Xiong Zhang, Baoping Wang, H. Yin, L. Tong

引用次数: 3

Abstract

The discharge process in a discharge cell of shadow mask plasma display panel (SM-PDP) has been calculated by means of fluid model. The relation between content of xenon in Ne-Xe mixture gas, pressure and efficiency has been investigated for SM-PDP. Simulation results show that the resonance xenon responsible for 147nm UV decreases with the increasing of the content of xenon and pressure, while the molecular xenon, radiating 173nm UV, increases. The efficacy of SM-PDP could be enhanced further if the phosphor is selected carefully considering of this conclusion.

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荫罩PDP中原子和分子辐射的研究

采用流体模型计算了荫罩等离子体显示面板(SM-PDP)放电池的放电过程。研究了SM-PDP中Ne-Xe混合气体中氙含量与压力和效率的关系。模拟结果表明，随着氙含量和压力的增加，负责147nm紫外的共振氙减少，而辐射173nm紫外的分子氙增加。考虑到这一结论，仔细选择荧光粉可以进一步提高SM-PDP的疗效。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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来源期刊

IVESC 2004. The 5th International Vacuum Electron Sources Conference Proceedings (IEEE Cat. No.04EX839)

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