IEEE VLSI-TSA International Symposium on VLSI Technology, 2005. (VLSI-TSA-Tech).

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IEEE VLSI-TSA International Symposium on VLSI Technology, 2005. (VLSI-TSA-Tech). - 最新文献

A 0.168/spl mu/m/sup 2//0.11/spl mu/m/sup 2/ highly scalable high performance embedded DRAM cell for 90/65-nm logic applications

Pub Date : 2005-04-25 DOI: 10.1109/VTSA.2005.1497070 G. Wang, P. Parries, B. Khan, J. Liu, Y. Otani, J. Norum, N. Robson, T. Kirihata, S. Iyer

Recent advances in MRAM technology

Pub Date : 2005-04-25 DOI: 10.1109/VTSA.2005.1497086 W. Gallagher, D. Abraham, S. Assefa, S. Brown, J. DeBrosse, M. Gaidis, E. Galligan, E. Gow, B. Hughes, J. Hummel, S. Kanakasabapathy, C. Kaiser, M. Lamorey, T. Maffit, K. Milkove, Yu Lu, J. Nowak, P. Rice, M. Samant, E. O'Sullivan, S. Parkin, R. Robertazzi, P. Trouilloud, D. Worledge, G. Wright, See-Hun Yang

A systematic study of the influence of nitrogen in tuning the effective work function of nitrided metal gates

Pub Date : 2005-04-25 DOI: 10.1109/VTSA.2005.1497097 H. Wen, K. Choi, P. Majhi, H. Alshareef, C. Huffman, B. Lee

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