Metrology, Inspection, and Process Control for Microlithography XXXIII

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Metrology, Inspection, and Process Control for Microlithography XXXIII - 最新文献

Super-resolution fluorescence nanoscopy opportunities for EUV resist inspection and metrology (Conference Presentation)

Pub Date : 2019-08-16 DOI: 10.1117/12.2515260 J. Petersen

Machine learning and hybrid metrology using scatterometry and LE-XRF to detect voids in copper lines

Pub Date : 2019-07-02 DOI: 10.1117/12.2515257 Kong Dexin, Motoyama Koichi, A. A. D. L. Pena, Huai Huang, B. Mendoza, M. Breton, G. R. Muthinti, H. Shobha, Liying Jiang, Juntao Li, J. Demarest, J. Gaudiello, G. Karve, A. Cepler, M. Sendelbach, Susan Emans, P. Isbester, K. Shah, Shay Wolfing, Avron Ger

Improved sub-surface AFM using photothermal actuation

Pub Date : 2019-07-02 DOI: 10.1117/12.2515441 Maarten E. v. Reijzen, M. Tamer, M. V. Es, M. Riel, A. Keyvani, H. Sadeghian, M. Lans

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