纳米晶Ni81P19合金的晶粒生长

Á. Révész , J. Lendvai , I. Bakonyi
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引用次数: 6

摘要

对Ni81P19非晶合金在600 K下等温退火1200 s,形成平均晶粒尺寸为10 nm的纳米晶态。采用差示扫描量热法(DSC)和x射线衍射法(XRD)研究进一步热处理的影响。从纳米晶状态开始的线性加热DSC扫描显示,在600 K至770 K之间有广泛的放热贡献,对应于晶粒生长过程。等温退火使纳米晶合金完全形成fcc-Ni和Ni3P相。这一过程在低退火温度下以正常晶粒生长的方式进行,而随着退火温度的升高,晶粒生长出现异常。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Grain growth in a nanocrystalline Ni81P19 alloy

Isothermal annealing of a Ni81P19 amorphous alloy performed at 600 K for 1200 s resulted in the formation of a nanocrystalline state with 10 nm average grain size. Differential scanning calorimetry (DSC) and X-ray diffraction (XRD) measurements were performed to study the influence of further heat treatments. Linear-heating DSC scan starting from the nanocrystalline state revealed a broad exothermic contribution between 600 K and 770 K, corresponding to a grain-growth process. Isothermal annealing of the nanocrystalline alloy yields the complete formation of fcc-Ni and Ni3P phases. This process took place by normal grain-growth at low annealing temperatures, while abnormal grain-growth was observed with increasing annealing temperatures.

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