快速光学扫描偏转法测量晶圆片形貌

2003 Conference on Lasers and Electro-Optics Europe (CLEO/Europe 2003) (IEEE Cat. No.03TH8666) Pub Date : 2003-06-22 DOI:10.1109/CLEOE.2003.1313528

S. Krey, F. Peter, E. Dumitrescu, W. D. van Amstel, R. G. Klaver, E. Lous

{"title":"快速光学扫描偏转法测量晶圆片形貌","authors":"S. Krey, F. Peter, E. Dumitrescu, W. D. van Amstel, R. G. Klaver, E. Lous","doi":"10.1109/CLEOE.2003.1313528","DOIUrl":null,"url":null,"abstract":"Fast optical scanning deflectometry has been introduced for the measurement of the surface figure of optical surfaces. The measurement principle is based on physical ray tracing by means of a narrow laser beam deflected by an oscillating mirror and a large lens arranged for telecentric scanning. A new design of an instrument capable of measuring 12-inch wafers within 60 s and with a slope resolution better 1 /spl mu/rad is presented.","PeriodicalId":6370,"journal":{"name":"2003 Conference on Lasers and Electro-Optics Europe (CLEO/Europe 2003) (IEEE Cat. No.03TH8666)","volume":"12 1","pages":"465-"},"PeriodicalIF":0.0000,"publicationDate":"2003-06-22","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Wafer topography measurement by fast optical scanning deflectometry\",\"authors\":\"S. Krey, F. Peter, E. Dumitrescu, W. D. van Amstel, R. G. Klaver, E. Lous\",\"doi\":\"10.1109/CLEOE.2003.1313528\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Fast optical scanning deflectometry has been introduced for the measurement of the surface figure of optical surfaces. The measurement principle is based on physical ray tracing by means of a narrow laser beam deflected by an oscillating mirror and a large lens arranged for telecentric scanning. A new design of an instrument capable of measuring 12-inch wafers within 60 s and with a slope resolution better 1 /spl mu/rad is presented.\",\"PeriodicalId\":6370,\"journal\":{\"name\":\"2003 Conference on Lasers and Electro-Optics Europe (CLEO/Europe 2003) (IEEE Cat. No.03TH8666)\",\"volume\":\"12 1\",\"pages\":\"465-\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2003-06-22\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2003 Conference on Lasers and Electro-Optics Europe (CLEO/Europe 2003) (IEEE Cat. No.03TH8666)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/CLEOE.2003.1313528\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2003 Conference on Lasers and Electro-Optics Europe (CLEO/Europe 2003) (IEEE Cat. No.03TH8666)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/CLEOE.2003.1313528","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}

引用次数: 0

摘要

介绍了快速光学扫描偏转法测量光学表面形貌的方法。测量原理是基于物理射线追踪，通过振荡镜偏转窄激光束和设置远心扫描的大透镜。提出了一种新的仪器设计，可以在60秒内测量12英寸晶圆，斜率分辨率达到1 /spl mu/rad。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

查看原文本刊更多论文

Wafer topography measurement by fast optical scanning deflectometry

Fast optical scanning deflectometry has been introduced for the measurement of the surface figure of optical surfaces. The measurement principle is based on physical ray tracing by means of a narrow laser beam deflected by an oscillating mirror and a large lens arranged for telecentric scanning. A new design of an instrument capable of measuring 12-inch wafers within 60 s and with a slope resolution better 1 /spl mu/rad is presented.

求助全文

通过发布文献求助，成功后即可免费获取论文全文。去求助

来源期刊

2003 Conference on Lasers and Electro-Optics Europe (CLEO/Europe 2003) (IEEE Cat. No.03TH8666)

自引率

0.00%

发文量